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Journal Articles
- 2014
[j7]Ming-Hung Weng, Chao-Hung Chen, Che-Kai Lin, Shih-Hui Huang, Jhih-Han Du, Sheng-Wen Peng, Walter Wohlmuth, Frank Yung-Shi Chou, Chang-Hwang Hua:
Investigation of high performance Edge Lifted Capacitors reliability for GaAs and GaN MMIC technology. Microelectron. Reliab. 54(12): 2697-2703 (2014)- 2012
- [j6]Che-Kai Lin, Hsien-Chin Chiu
, Chao-Wei Lin, Hsuan-Ling Kao, Feng-Tso Chien:
Investigation on the thermal behavior of 0.15 μm gate-length In0.4Al0.6As/In0.4Ga0.6As MHEMT. Microelectron. Reliab. 52(6): 969-973 (2012) - [j5]Hsien-Chin Chiu, Che-Kai Lin, Chao-Wei Lin, Chao-Sung Lai:
Investigation of surface pretreatments on GaAs and memory characteristics of MOS capacitors embedded with Au nano-particles. Microelectron. Reliab. 52(11): 2592-2596 (2012) - 2011
- [j4]Chao-Wei Lin, Hsien-Chin Chiu, Che-Kai Lin, Jeffrey S. Fu:
High-k praseodymium oxide passivated AlGaN/GaN MOSFETs using P2S5/(NH4)2SX + UV interface treatment. Microelectron. Reliab. 51(2): 381-385 (2011) - [j3]Hsien-Chin Chiu, Chao-Hung Chen, Che-Kai Lin, Jeffrey S. Fu:
High electrical performance liquid-phase HBr oxidation gate insulator of InAlAs/InGaAs metamorphic MOS-mHEMT. Microelectron. Reliab. 51(8): 1337-1341 (2011) - [j2]Hsien-Chin Chiu, Chao-Wei Lin, Che-Kai Lin, Hsuan-Ling Kao, Jeffrey S. Fu:
Thermal stability investigations of AlGaN/GaN HEMTs with various high work function gate metal designs. Microelectron. Reliab. 51(12): 2163-2167 (2011) - 2010
- [j1]Hsien-Chin Chiu, Chih-Wei Yang, Chao-Hung Chen, Che-Kai Lin, Jeffrey S. Fu, Hsing-Yuan Tu, Shiang-Feng Tang:
High thermal stability AlGaAs/InGaAs enhancement-mode pHEMT using palladium-gate technology. Microelectron. Reliab. 50(6): 847-850 (2010)
Coauthor Index
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