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D. Beckmeier

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Journal Articles

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2018
[j2]
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D. Beckmeier, Andreas Martin:
Variation-resilient quantifiable plasma process induced damage monitoring. Microelectron. Reliab. 88-90: 152-158 (2018)
2016
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Andreas Martin, Rolf-Peter Vollertsen, A. Mitchell, M. Traving, D. Beckmeier, H. Nielen:
Fast wafer level reliability monitoring as a tool to achieve automotive quality for a wafer process. Microelectron. Reliab. 64: 2-12 (2016)

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