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2020 – today
- 2022
[j5]Michio Uneda
, Nodoka Yamada, Yoshihiro Tawara:
Polishing Characteristics and Mechanism of Polishing Glass Substrate Using Suede Pad with Fine Micrometer-Sized Pores. Int. J. Autom. Technol. 16(1): 52-59 (2022)- 2021
- [j4]Michio Uneda, Naoki Takahashi, Takashi Fujita, Yutaro Arai:
Flexible Fiber Conditioner for Fine Conditioning of Polishing Pad and its Evaluation in Chemical Mechanical Polishing: Verification of SUS-FFC on Soft Urethane Foam Pad and Proposal of PEEK-FFC. Int. J. Autom. Technol. 15(6): 878-884 (2021)
2010 – 2019
- 2018
- [j3]Natsuko Omiya, Hideo Aida, Yutaka Kimura, Yuki Kawamata, Seong-Woo Kim, Michio Uneda:
Patterned Sapphire Substrates for III-Nitride Epitaxial Growth. Int. J. Autom. Technol. 12(2): 179-186 (2018) - 2015
- [j2]Michio Uneda, Keiichi Takano, Koji Koyama, Hideo Aida, Ken-Ichi Ishikawa:
Investigation into Chemical Mechanical Polishing Mechanism of Hard-to-Process Materials Using a Commercially Available Single-Sided Polisher. Int. J. Autom. Technol. 9(5): 573-579 (2015) - 2014
- [j1]Koji Koyama, Hideo Aida, Michio Uneda, Hidetoshi Takeda, Seong-Woo Kim, Hiroki Takei, Tsutomu Yamazaki, Toshiro Doi:
Effects of N-Face Finishing on Geometry of Double-Side Polished GaN Substrate. Int. J. Autom. Technol. 8(1): 121-127 (2014)
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