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Boris Bayha

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2014
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Xinggong Wan, Sandhya Chandrashekhar, Boris Bayha, Martin Trentzsch, Torben Balzer, Mahesh Siddabathula, Oliver Aubel:
A quantitative study of Phosphorous implantation damage on the thick gate oxide of the 28 nm node. Microelectron. Reliab. 54(9-10): 2306-2309 (2014)

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