"Simulation of 0.35 μm/0.25 μm CMOS Technology Doping Profiles."

M. Lorenzini et al. (2001)

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DOI: 10.1155/2001/28105

access: open

type: Journal Article

metadata version: 2023-10-31

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M. Lorenzini, Luc Haspeslagh, Jan Van Houdt, Herman E. Maes:
Simulation of 0.35 μm/0.25 μm CMOS Technology Doping Profiles. VLSI Design 13(1-4): 459-463 (2001)

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