"Atomic-Layer-Deposited Alumina (hbox Al2hbox O3) ..."

Ossi M. Hahtela et al. (2009)

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DOI: 10.1109/TIM.2008.2006964

access: closed

type: Journal Article

metadata version: 2020-06-08

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Ossi M. Hahtela, A. F. Satrapinski, Päivi H. Sievila, Nikolai Chekurov:
Atomic-Layer-Deposited Alumina (hbox Al₂hbox O₃) Coating on Thin-Film Cryoresistors. IEEE Trans. Instrum. Meas. 58(4): 1183-1187 (2009)

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