"Lithography Options for the 32 nm Half Pitch Node and Beyond."

Kurt Ronse et al. (2009)

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DOI: 10.1109/TCSI.2009.2028417

access: closed

type: Journal Article

metadata version: 2020-05-22

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  - https://dblp.org/rec/journals/tcas/RonseJGHMWGJV09
Kurt Ronse, Philippe Jansen, Roel Gronheid, Eric Hendrickx, Mireille Maenhoudt, Vincent Wiaux, Mieke Goethals, R. Jonckheere, Geert Vandenberghe:
Lithography Options for the 32 nm Half Pitch Node and Beyond. IEEE Trans. Circuits Syst. I Regul. Pap. 56-I(8): 1884-1891 (2009)

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