"Co-Optimization of Circuits, Layout and Lithography for Predictive ..."

Tejas Jhaveri et al. (2010)

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DOI: 10.1109/TCAD.2010.2042882

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type: Journal Article

metadata version: 2025-03-03

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Tejas Jhaveri, Vyacheslav Rovner, Lars Liebmann, Larry T. Pileggi, Andrzej J. Strojwas, Jason Hibbeler:
Co-Optimization of Circuits, Layout and Lithography for Predictive Technology Scaling Beyond Gratings. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 29(4): 509-527 (2010)

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