"Effect of Plasma Oxygen Content on the Size and Content of Silicon ..."

Vladimir A. Terekhov et al. (2023)

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DOI: 10.3390/SYM15091800

access: open

type: Journal Article

metadata version: 2024-01-26

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Vladimir A. Terekhov, Evgeniy I. Terukov, Yurii K. Undalov, Konstantin A. Barkov, Nikolay A. Kurilo, Sergey A. Ivkov, Dmitry N. Nesterov, Pavel Seredin, Dmitry Goloshchapov, Dmitry Minakov, Elena V. Popova, Anatoly N. Lukin, Irina N. Trapeznikova:
Effect of Plasma Oxygen Content on the Size and Content of Silicon Nanoclusters in Amorphous SiOx Films Obtained with Plasma-Enhanced Chemical Vapor Deposition. Symmetry 15(9): 1800 (2023)

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