"Resonant MEMS Pressure Sensor in 180 nm CMOS Technology Obtained by BEOL ..."

Diana Mata-Hernandez et al. (2020)

> Home

Details and statistics

DOI: 10.3390/S20216037

access: open

type: Journal Article

metadata version: 2021-09-16

- view
  - electronic edition via DOI (open access)
  authority control:
- export record
  dblp key:
  - journals/sensors/Mata-HernandezF20
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/journals/sensors/Mata-HernandezF20
Diana Mata-Hernandez, Daniel Fernández, Saoni Banerji, Jordi Madrenas:
Resonant MEMS Pressure Sensor in 180 nm CMOS Technology Obtained by BEOL Isotropic Etching. Sensors 20(21): 6037 (2020)

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.