"Dependence of process parameters on planarization isolation and etching of ..."

J. K. Singh et al. (1987)

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DOI: 10.1109/PROC.1987.13810

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type: Journal Article

metadata version: 2022-09-09

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J. K. Singh, A. Roybardhan, H. S. Kothari, B. R. Singh, W. S. Khokle:
Dependence of process parameters on planarization isolation and etching of sloped vias in polyimides for GaAs ICs. Proc. IEEE 75(6): 850-852 (1987)

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