"Effects of the sputtering deposition process of metal gate electrode on ..."

Takayuki Yamada et al. (2001)

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DOI: 10.1016/S0026-2714(00)00262-6

access: closed

type: Journal Article

metadata version: 2020-02-22

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Takayuki Yamada, Masaru Moriwaki, Yoshinao Harada, Shinji Fujii, Koji Eriguchi:
Effects of the sputtering deposition process of metal gate electrode on the gate dielectric characteristics. Microelectron. Reliab. 41(5): 697-704 (2001)

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