"Heat stress exposing performance of deep-nano HK/MG nMOSFETs using DPN or ..."

Shea-Jue Wang et al. (2015)

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DOI: 10.1016/J.MICROREL.2015.05.016

access: closed

type: Journal Article

metadata version: 2022-10-02

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Shea-Jue Wang, Mu-Chun Wang, Shuang-Yuan Chen, Wen-How Lan, Bor-Wen Yang, L. S. Huang, Chuan-Hsi Liu:
Heat stress exposing performance of deep-nano HK/MG nMOSFETs using DPN or PDA treatment. Microelectron. Reliab. 55(11): 2203-2207 (2015)

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