"Improvement on sheet resistance uniformity of nickel silicide by ..."

Ryuji Tomita et al. (2013)

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DOI: 10.1016/J.MICROREL.2012.12.011

access: closed

type: Journal Article

metadata version: 2020-08-17

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Ryuji Tomita, Hidehiko Kimura, M. Yasuda, K. Maeda, S. Ueno, T. Tonegawa, T. Fujimoto, M. Moritoki, Hiroshi Iwai:
Improvement on sheet resistance uniformity of nickel silicide by optimization of silicidation conditions. Microelectron. Reliab. 53(5): 665-669 (2013)

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