"Study of hafnium oxide deposited using Dense Plasma Focus machine for film ..."

A. Srivastava et al. (2011)

> Home

Details and statistics

DOI: 10.1016/J.MICROREL.2010.12.002

access: closed

type: Journal Article

metadata version: 2020-02-22

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - journals/mr/SrivastavaNSSM11
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/journals/mr/SrivastavaNSSM11
A. Srivastava, R. K. Nahar, Chandan Kumar Sarkar, W. P. Singh, Y. Malhotra:
Study of hafnium oxide deposited using Dense Plasma Focus machine for film structure and electrical properties as a MOS device. Microelectron. Reliab. 51(4): 751-755 (2011)

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.