"Electromigration in width transition copper interconnect."

Arijit Roy, Yuejin Hou, Cher Ming Tan (2009)

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DOI: 10.1016/J.MICROREL.2009.06.038

access: closed

type: Journal Article

metadata version: 2022-09-27

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Arijit Roy, Yuejin Hou, Cher Ming Tan:
Electromigration in width transition copper interconnect. Microelectron. Reliab. 49(9-11): 1086-1089 (2009)

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