"Contoured device sample preparation technique for ±5 μm ..."

Chris Richardson et al. (2013)

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DOI: 10.1016/J.MICROREL.2013.07.073

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type: Journal Article

metadata version: 2020-02-22

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Chris Richardson, Gary Liechty, Clay Smith, Michael Karow:
Contoured device sample preparation technique for ±5 μm remaining silicon thicknesses that meets solid immersion lens requirements. Microelectron. Reliab. 53(9-11): 1434-1438 (2013)

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