"Stress induced gate-drain leakage current in ultra-thin gate oxide."

Christian Petit, Damien Zander (2007)

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DOI: 10.1016/J.MICROREL.2006.10.013

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type: Journal Article

metadata version: 2022-06-17

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Christian Petit, Damien Zander:
Stress induced gate-drain leakage current in ultra-thin gate oxide. Microelectron. Reliab. 47(12): 2070-2081 (2007)

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