"Analysis of deep submicron VLSI technological risks: A new qualification ..."

F. Molière et al. (2009)

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DOI: 10.1016/J.MICROREL.2009.07.001

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type: Journal Article

metadata version: 2023-09-30

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F. Molière, B. Foucher, Philippe Perdu, Alain Bravaix:
Analysis of deep submicron VLSI technological risks: A new qualification process for professional electronics. Microelectron. Reliab. 49(9-11): 1381-1385 (2009)

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