"Carrier separation analysis for clarifying carrier conduction and ..."

Wataru Mizubayashi et al. (2005)

> Home

Details and statistics

DOI: 10.1016/J.MICROREL.2004.12.016

access: closed

type: Journal Article

metadata version: 2020-02-22

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - journals/mr/MizubayashiYOOHITYHN05
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/journals/mr/MizubayashiYOOHITYHN05
Wataru Mizubayashi, Naoki Yasuda, Kenji Okada, Hiroyuki Ota, Hirokazu Hisamatsu, Kunihiko Iwamoto, Koji Tominaga, Katsuhiko Yamamoto, Tsuyoshi Horikawa, Toshihide Nabatame:
Carrier separation analysis for clarifying carrier conduction and degradation mechanisms in high-k stack gate dielectrics. Microelectron. Reliab. 45(7-8): 1041-1050 (2005)

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.