"Flexible metal-insulator-metal capacitor using plasma enhanced binary ..."

Jagan Singh Meena et al. (2010)

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DOI: 10.1016/J.MICROREL.2010.01.046

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type: Journal Article

metadata version: 2024-10-06

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Jagan Singh Meena, Min-Ching Chu, Jitendra N. Tiwari, Hsin-Chiang You, Chung-Hsin Wu, Fu-Hsiang Ko:
Flexible metal-insulator-metal capacitor using plasma enhanced binary hafnium-zirconium-oxide as gate dielectric layer. Microelectron. Reliab. 50(5): 652-656 (2010)

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