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"Effect of SiO2/Si interface roughness on gate current."
Lingfeng Mao et al. (2001)
- Lingfeng Mao
, Yao Yang, Jian-Lin Wei, Heqiu Zhang, Mingzhen Xu, Changhua Tan:
Effect of SiO2/Si interface roughness on gate current. Microelectron. Reliab. 41(11): 1903-1907 (2001)
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