"Tuneable electrical properties of hafnium aluminate gate dielectrics ..."

Y. Lu et al. (2007)

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DOI: 10.1016/J.MICROREL.2007.01.052

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type: Journal Article

metadata version: 2020-02-22

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Y. Lu, Octavian Buiu, Steve Hall, Ivona Z. Mitrovic, W. Davey, R. J. Potter, Paul R. Chalker:
Tuneable electrical properties of hafnium aluminate gate dielectrics deposited by metal organic chemical vapour deposition. Microelectron. Reliab. 47(4-5): 722-725 (2007)

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