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"A case study of defects due to process marginalities in deep sub-micron ..."
Hung-Sung Lin et al. (2007)
- Hung-Sung Lin, Chun-Ming Chen, Kuo-Hsiung Chen, Afung Wang, C. H. Chao:
A case study of defects due to process marginalities in deep sub-micron technology. Microelectron. Reliab. 47(9-11): 1604-1608 (2007)
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