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"N-MOSFET oxide trap characterization induced by nitridation process using ..."
Cédric Leyris et al. (2007)
- Cédric Leyris, Frédéric Martinez, Alain Hoffmann, M. Valenza, J. C. Vildeuil:
N-MOSFET oxide trap characterization induced by nitridation process using RTS noise analysis. Microelectron. Reliab. 47(1): 41-45 (2007)
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