"Modelling the effect of uneven PWB surface on stencil bending during ..."

Olivér Krammer et al. (2012)

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DOI: 10.1016/J.MICROREL.2011.08.012

access: closed

type: Journal Article

metadata version: 2020-02-22

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Olivér Krammer, László Milán Molnár, László Jakab, András Szabó:
Modelling the effect of uneven PWB surface on stencil bending during stencil printing process. Microelectron. Reliab. 52(1): 235-240 (2012)

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