"Reliability of High-K Dielectrics and Its Dependence on Gate Electrode and ..."

Y. H. Kim et al. (2004)

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DOI: 10.1016/J.MICROREL.2004.07.049

access: closed

type: Journal Article

metadata version: 2021-10-27

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Y. H. Kim, Rino Choi, R. Jha, J. H. Lee, Veena Misra, J. C. Lee:
Reliability of High-K Dielectrics and Its Dependence on Gate Electrode and Interfacial / High-K Bi-Layer Structure. Microelectron. Reliab. 44(9-11): 1513-1518 (2004)

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