"Trend transformation of drain-current degradation under drain-avalanche ..."

Zhen-Ying Hsieh et al. (2009)

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DOI: 10.1016/J.MICROREL.2009.05.011

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type: Journal Article

metadata version: 2022-10-02

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Zhen-Ying Hsieh, Mu-Chun Wang, Chih Chen, Jia-Min Shieh, Yu-Ting Lin, Shuang-Yuan Chen, Heng-Sheng Huang:
Trend transformation of drain-current degradation under drain-avalanche hot-carrier stress for CLC n-TFTs. Microelectron. Reliab. 49(8): 892-896 (2009)

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