"Modeling the effect of barrier thickness and low-k dielectric on circuit ..."

Feifei He, Cher Ming Tan (2010)

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DOI: 10.1016/J.MICROREL.2010.07.111

access: closed

type: Journal Article

metadata version: 2020-02-22

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Feifei He, Cher Ming Tan:
Modeling the effect of barrier thickness and low-k dielectric on circuit reliability using 3D model. Microelectron. Reliab. 50(9-11): 1327-1331 (2010)

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