"Effects of SiO2 film thickness and operating temperature on ..."

Chang-Fu Han et al. (2018)

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DOI: 10.1016/J.MICROREL.2018.02.006

access: closed

type: Journal Article

metadata version: 2021-04-09

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  - https://dblp.org/rec/journals/mr/HanGCSL18
Chang-Fu Han, Yi-Zhe Guo, Chung-Jen Chung, Chang-Hong Shen, Jen-Fin Lin:
Effects of SiO₂ film thickness and operating temperature on thermally-induced failures in through-silicon-via structures. Microelectron. Reliab. 83: 1-13 (2018)

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