"Effects of base layer thickness on reliability of CVD ..."

Koji Eriguchi, Yoshinao Harada, Masaaki Niwa (2001)

> Home

Details and statistics

DOI: 10.1016/S0026-2714(00)00247-X

access: closed

type: Journal Article

metadata version: 2020-02-22

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - journals/mr/EriguchiHN01
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/journals/mr/EriguchiHN01
Koji Eriguchi, Yoshinao Harada, Masaaki Niwa:
Effects of base layer thickness on reliability of CVD Si₃N₄ stack gate dielectrics. Microelectron. Reliab. 41(4): 587-595 (2001)

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.