"On the influence of substrate cleaning method and rapid thermal annealing ..."

Salvador Dueñas et al. (2005)

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DOI: 10.1016/J.MICROREL.2004.11.012

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type: Journal Article

metadata version: 2020-02-22

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Salvador Dueñas, Helena Castán, Héctor García, J. Barbolla, E. San Andrés, I. Mártil, G. González-Díaz:
On the influence of substrate cleaning method and rapid thermal annealing conditions on the electrical characteristics of Al/SiN_x/SiO₂/Si fabricated by ECR-CVD. Microelectron. Reliab. 45(5-6): 978-981 (2005)

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