![](https://dblp.uni-trier.de./img/logo.ua.320x120.png)
![](https://dblp.uni-trier.de./img/dropdown.dark.16x16.png)
![](https://dblp.uni-trier.de./img/peace.dark.16x16.png)
Остановите войну!
for scientists:
![search dblp search dblp](https://dblp.uni-trier.de./img/search.dark.16x16.png)
![search dblp](https://dblp.uni-trier.de./img/search.dark.16x16.png)
default search action
"Scanning spreading resistance microscopy for failure analysis of nLDMOS ..."
Stefan Doering et al. (2014)
- Stefan Doering, Ralf Rudolf, Martin Pinkert, Hagen Roetz, Catejan Wagner, Stefan Eckl, Marc Strasser, Andre Wachowiak, Thomas Mikolajick
:
Scanning spreading resistance microscopy for failure analysis of nLDMOS devices with decreased breakdown voltage. Microelectron. Reliab. 54(9-10): 2128-2132 (2014)
![](https://dblp.uni-trier.de./img/cog.dark.24x24.png)
manage site settings
To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.