"A methodology for the calculation of stress migration in die-level ..."

W. Dauksher, P. Marcoux, G. Castleman (2006)

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DOI: 10.1016/J.MICROREL.2005.05.021

access: closed

type: Journal Article

metadata version: 2020-02-22

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W. Dauksher, P. Marcoux, G. Castleman:
A methodology for the calculation of stress migration in die-level interconnects. Microelectron. Reliab. 46(2-4): 616-625 (2006)

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