"Plasma-enhanced flexible metal-insulator-metal capacitor using high-k ..."

Min-Ching Chu et al. (2010)

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DOI: 10.1016/J.MICROREL.2010.05.004

access: closed

type: Journal Article

metadata version: 2020-02-22

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Min-Ching Chu, Jagan Singh Meena, Chih-Chia Cheng, Hsin-Chiang You, Feng-Chih Chang, Fu-Hsiang Ko:
Plasma-enhanced flexible metal-insulator-metal capacitor using high-k ZrO₂ film as gate dielectric with improved reliability. Microelectron. Reliab. 50(8): 1098-1102 (2010)

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