"Electrical properties of metal-HfO2-silicon system measured ..."

Fu-Chien Chiu, Shun-An Lin, Joseph Ya-min Lee (2005)

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DOI: 10.1016/J.MICROREL.2004.11.016

access: closed

type: Journal Article

metadata version: 2020-02-22

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Fu-Chien Chiu, Shun-An Lin, Joseph Ya-min Lee:
Electrical properties of metal-HfO₂-silicon system measured from metal-insulator-semiconductor capacitors and metal-insulator-semiconductor field-effect transistors using HfO₂ gate dielectric. Microelectron. Reliab. 45(5-6): 961-964 (2005)

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