"Investigation of the effects of constant voltage stress on thin ..."

Philippe Chiquet et al. (2012)

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DOI: 10.1016/J.MICROREL.2012.06.124

access: closed

type: Journal Article

metadata version: 2020-02-22

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Philippe Chiquet, Pascal Masson, Romain Laffont, Gilles Micolau, Jérémy Postel-Pellerin, Frédéric Lalande, Bernard Bouteille, Jean-Luc Ogier:
Investigation of the effects of constant voltage stress on thin SiO₂ layers using dynamic measurement protocols. Microelectron. Reliab. 52(9-10): 1895-1900 (2012)

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