"Time-dependent-dielectric-breakdown characteristics of Hf-doped ..."

Elena Atanassova et al. (2014)

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DOI: 10.1016/J.MICROREL.2013.10.008

access: closed

type: Journal Article

metadata version: 2024-11-26

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Elena Atanassova, Nenad Novkovski, Dencho Spassov, Albena Paskaleva, Aleksandar Skeparovski:
Time-dependent-dielectric-breakdown characteristics of Hf-doped Ta₂O₅/SiO₂ stack. Microelectron. Reliab. 54(2): 381-387 (2014)

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