"Experimental analysis and optimization of a photo resist coating process ..."

Yung-Kuang Yang, Tsun-Ching Chang (2006)

> Home

Details and statistics

DOI: 10.1016/J.MEJO.2005.10.006

access: closed

type: Journal Article

metadata version: 2020-02-22

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - journals/mj/YangC06
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/journals/mj/YangC06
Yung-Kuang Yang, Tsun-Ching Chang:
Experimental analysis and optimization of a photo resist coating process for photolithography in wafer fabrication. Microelectron. J. 37(8): 746-751 (2006)

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.