"Impact of barrier deposition process on electrical and reliability ..."

C. F. Tsang et al. (2004)

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DOI: 10.1016/J.MEJO.2004.06.019

access: closed

type: Journal Article

metadata version: 2020-02-22

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C. F. Tsang, C. Y. Li, A. Krishnamoorthy, Y. J. Su, H. Y. Li, L. Y. Wong, W. H. Li, L. J. Tang, K. Y. Ee:
Impact of barrier deposition process on electrical and reliability performance of Cu/CVD low k SiOCH metallization. Microelectron. J. 35(9): 693-700 (2004)

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