"Feasible approach to the fabrication of asymmetric Schottky barrier ..."

L. Sun et al. (2006)

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DOI: 10.1016/J.MEJO.2005.05.012

access: closed

type: Journal Article

metadata version: 2020-02-22

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L. Sun, D. Y. Li, X. Y. Liu, R. Q. Han:
Feasible approach to the fabrication of asymmetric Schottky barrier MOSFETs by using the spacer technique. Microelectron. J. 37(4): 332-335 (2006)

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