"An enhanced Gate Diffusion Input technique for low power applications."

S. Radhakrishnan, T. Nirmalraj, Rakesh Kumar Karn (2019)

> Home

Details and statistics

DOI: 10.1016/J.MEJO.2019.104621

access: closed

type: Journal Article

metadata version: 2022-06-23

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - journals/mj/RadhakrishnanNk19
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/journals/mj/RadhakrishnanNk19
S. Radhakrishnan, T. Nirmalraj, Rakesh Kumar Karn:
An enhanced Gate Diffusion Input technique for low power applications. Microelectron. J. 93 (2019)

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.