"Investigation of the implanted phosphorus in a boron doped SiGe epitaxial ..."

R. Kinder et al. (2006)

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DOI: 10.1016/J.MEJO.2005.07.010

access: closed

type: Journal Article

metadata version: 2020-02-22

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R. Kinder, A. Vincze, M. Kuruc, R. Srnánek, B. Lojek, B. Sopko, D. Chren:
Investigation of the implanted phosphorus in a boron doped SiGe epitaxial layer. Microelectron. J. 37(7): 642-645 (2006)

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