"Modeling growth rate of HfO2 thin films grown by metal-organic ..."

Myoung-Seok Kim et al. (2006)

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DOI: 10.1016/J.MEJO.2005.04.055

access: closed

type: Journal Article

metadata version: 2020-02-22

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Myoung-Seok Kim, Young-Don Ko, Tae-Houng Moon, Jae-Min Myoung, Ilgu Yun:
Modeling growth rate of HfO₂ thin films grown by metal-organic molecular beam epitaxy. Microelectron. J. 37(2): 98-106 (2006)

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