"The aligned Si nanowires growth using MW plasma enhanced CVD."

N. N. Dzbanovsky et al. (2005)

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DOI: 10.1016/J.MEJO.2005.04.035

access: closed

type: Journal Article

metadata version: 2020-02-22

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N. N. Dzbanovsky, V. V. Dvorkin, V. G. Pirogov, N. V. Suetin:
The aligned Si nanowires growth using MW plasma enhanced CVD. Microelectron. J. 36(7): 634-638 (2005)

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