Stop the war!

Остановите войну!

for scientists:

default search action

combined dblp search
author search
venue search
publication search

ask others

"Micromachined high-Q inductors in a 0.18-μm copper interconnect low-k ..."

Hasnain Lakdawala et al. (2002)

> Home

Details and statistics

DOI: 10.1109/4.987092

access: closed

type: Journal Article

metadata version: 2022-04-09

- view
  - electronic edition via DOI
  - unpaywalled version
  authority control:
- export record
  dblp key:
  - journals/jssc/LakdawalaZLSCF02
- ask others
- share record
  persistent URL:
  - https://dblp.org/rec/journals/jssc/LakdawalaZLSCF02
Hasnain Lakdawala, Xu Zhu, Hao Luo, Suresh Santhanam, L. Richard Carley, Gary K. Fedder:
Micromachined high-Q inductors in a 0.18-μm copper interconnect low-k dielectric CMOS process. IEEE J. Solid State Circuits 37(3): 394-403 (2002)

a service of

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.