"High-Aspect-Ratio Nanoscale Patterning in a Negative Tone Photoresist."

Kwangki Ryoo, Jeong-Bong Lee (2015)

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DOI: 10.6109/JICCE.2015.13.1.056

access: open

type: Journal Article

metadata version: 2021-02-16

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  - https://dblp.org/rec/journals/jicce/RyooL15a
Kwangki Ryoo, Jeong-Bong Lee:
High-Aspect-Ratio Nanoscale Patterning in a Negative Tone Photoresist. J. Inform. and Commun. Convergence Engineering 13(1): 56-61 (2015)

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