"Corrigendum to "Scaling equations for the accurate prediction of CMOS ..."

Aaron Stillmaker, Bevan M. Baas (2019)

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DOI: 10.1016/J.VLSI.2019.04.006

access: closed

type: Journal Article

metadata version: 2020-02-20

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Aaron Stillmaker, Bevan M. Baas:
Corrigendum to "Scaling equations for the accurate prediction of CMOS device performance from 180 nm to 7 nm" [Integr. VLSI J. 58. (2017) 74-81]. Integr. 67: 170 (2019)

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