"Substrate noise isolation improvement in a single-well standard CMOS process."

Pedro Mendonça dos Santos, Luís Mendes, João Caldinhas Vaz (2016)

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DOI: 10.1016/J.VLSI.2015.09.006

access: closed

type: Journal Article

metadata version: 2020-02-20

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Pedro Mendonça dos Santos, Luís Mendes, João Caldinhas Vaz:
Substrate noise isolation improvement in a single-well standard CMOS process. Integr. 52: 122-128 (2016)

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