"Pad conditioning in chemical mechanical polishing: a conditioning density ..."

Emmanuel A. Baisie, Zhichao Li, Xiaohong Zhang (2013)

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DOI: 10.1504/IJMR.2013.051836

access: closed

type: Journal Article

metadata version: 2020-08-25

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Emmanuel A. Baisie, Zhichao Li, Xiaohong Zhang:
Pad conditioning in chemical mechanical polishing: a conditioning density distribution model to predict pad surface shape. Int. J. Manuf. Res. 8(1): 103-119 (2013)

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